Teflon cleaning carrier for wafer fragments, with a rod height of 15 cm. It features high temperature resistance, acid and alkali resistance, and resistance to various organic solvents, making it suitable for wafer cleaning and etching processes. The carrier consists of a handle and a Teflon tray, with holes drilled on the tray to facilitate the penetration of developer solution for the developing process. The handle design enables easy operation of the developing process and prevents contamination of the developer solution by tweezers or gloves.
1、Suitable for the cleaning and etching of wafer fragments;
2、Classified by material into Teflon carriers and quartz carriers;
3、Customization is available to meet special requirements.
